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P‐83: Comparison of Characteristic Pattern Form along the Photo‐resist Binders
Author(s) -
Kim Da-Eun,
Lee Sang-Wook,
Han Sang-Hun,
Kwak Mu-Sun,
Lee Jun-ho,
Jun Mike,
Kang In-Boung
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11947
Subject(s) - photoresist , color gel , resist , fabrication , materials science , filter (signal processing) , color filter array , optoelectronics , nanotechnology , computer science , computer vision , layer (electronics) , medicine , pathology , thin film transistor , alternative medicine
Deep color technology enables more vivid colors to be realized on the display. The fabrication of deep color filters requires a high degree of patterning technology. The binder of the photoresist has an important role in formation of color filter patterns. The pattern characteristics are affected by the binder contents (%) and type of binders whether they have reactive substituents or not and what their molecular weight is.