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P‐77: Novel and Highly Reliable XeF and KrF Excimer Laser Annealing for Reducing the Cost of Flat Panel Display Equipment
Author(s) -
Imokawa Kaname,
Tanaka Satoshi,
Ashikawa Koji,
Watanabe Yosuke,
Nagashima Takayuki,
Maekawa Junichi,
Katsuumi Hisakazu,
Umeda Hiroshi,
Nohdomi Ryoichi,
Matsunaga Takashi,
Suzuki Akiyoshi,
Fujimoto Junichi,
Mizoguchi Hakaru
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11941
Subject(s) - excimer , excimer laser , laser , flat panel , optoelectronics , materials science , annealing (glass) , flat panel display , semiconductor , optics , physics , composite material
One of the most important goals of flat panel display (FPD) manufacturing is to reduce the cost of excimer laser annealing (ELA) processes of low‐temperature poly‐Si (LTPS) technology. We developed novel XeF (351 nm) and KrF (248 nm) excimer lasers specially designed for ELA. The semiconductor‐field‐proven excimer laser technologies are applied to stabilize the operation and to reduce the cost.