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P‐62: Nondestructive Patterning Process of Transparent Graphene Electrodes
Author(s) -
Guo Kang,
Gu Xin,
Xu Wei,
Zhang Xiao,
Zhu Ming,
Di Yunping,
Lv Zhijun,
Liu Zhen,
Yuan Guangcai,
Yao Jikai
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11927
Subject(s) - graphene , materials science , sheet resistance , etching (microfabrication) , transmittance , electrode , nanotechnology , graphene foam , optoelectronics , graphene nanoribbons , graphene oxide paper , plasma etching , layer (electronics) , chemistry
CVD graphene films were patterned through O 2 plasma etching method with sacrificial metal. Clear patterned transparent graphene films were obtained, and the patterning process do no harm to the sheet resistance and optical transmittance of graphene.