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P‐61: Development of High Sensitivity PAC material for improve Aligner Lens Mura
Author(s) -
Na Younsung,
Min Sungsik,
Kang Dongwoo,
Choi Youngseok,
Shin SangMun
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11926
Subject(s) - mura , lens (geology) , sensitivity (control systems) , closing (real estate) , materials science , optics , engineering , optoelectronics , physics , electronic engineering , liquid crystal display , business , finance
Negative PAC is very sensitive to photo and has higher productivity. However, this type is prone to mura formed during the exposure and development. We have been developed lens mura free material. PAC Hole closing caused by increasing photo sensitivity can be solved by Mask OPC technology.