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74‐4: Large Pixel Reflective Color Display for Outdoor Applications
Author(s) -
Ji Zhong
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11835
Subject(s) - pixel , photolithography , interferometry , microelectromechanical systems , materials science , optoelectronics , optics , computer science , artificial intelligence , physics
A 4x4 mm analog interferometric color pixel is fabricated using a unique micro‐assembly method that overcomes the limitations of traditional MEMS photolithography. Low cost methods in semiconductor packaging can be adapted to assemble the low resolution pixel array. The proposed method keeps large interferometric surfaces parallel with optical precision for high color purity and reflectivity.