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44‐1: Invited Paper : Photolithography as Enabler of AMOLED Displays Beyond 1000 ppi
Author(s) -
Malinowski Paweł E.,
Ke TungHuei,
Nakamura Atsushi,
Vicca Peter,
Kronemeijer Auke Jisk,
Ameys Marc,
van der Steen Jan Laurens,
Steudel Sören,
Kamochi Yoshitaka,
Iwai Yu,
Gelinck Gerwin,
Heremans Paul
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11715
Subject(s) - amoled , photolithography , computational lithography , oled , fabrication , enabling , optoelectronics , materials science , computer science , lithography , nanotechnology , multiple patterning , resist , thin film transistor , medicine , active matrix , alternative medicine , layer (electronics) , pathology , psychiatry
This paper describes the potential of hi‐res display fabrication using OLED photolithography. We demonstrate 1250 ppi multicolor arrays, pixel scaling down to 3 μm pitch, integration in active displays, and improving lifetime after patterning (200 hours T75, smOLEDs). Photolithography can enable low‐cost, high resolution displays for the 8K – VR era.