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39‐3: Patternable Color‐conversion Films based on Thick‐shell Quantum Dots
Author(s) -
Lien Jiun-Yi,
Chen Chih-Jung,
Chiang Ray-Kuang,
Wang Sue-Lein
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11706
Subject(s) - gamut , photoresist , quantum dot , materials science , brightness , optoelectronics , color filter array , lithography , absorbance , nanoimprint lithography , photolithography , color gel , quantum yield , optics , nanotechnology , fluorescence , fabrication , physics , layer (electronics) , thin film transistor , medicine , alternative medicine , pathology
Thick‐shell quantum dots (QDs) with green and red emission as well as high absorbance values are fabricated and dispersed in a commercial photoresist with density larger than 20 wt %. Such QD‐photoresist composites enable next‐generation displays with high brightness and wide color gamut (> 90 % Rec. 2020 coverage) through traditional lithography process for color filters. The emissive QD‐color filters (QDCFs) with thickness below 6 μm show optical density (O.D.) above 0.9 and film quantum yield reaching 70 %. The patterned QDCFs with 20~40 wt % of QDs reach the minimum line width about 7 μm.