39‐3: Patternable Color‐conversion Films based on Thick‐shell Quantum Dots | Zendy

Lien Jiun-Yi | Zendy; Chen Chih-Jung | Zendy; Chiang Ray-Kuang | Zendy; Wang Sue-Lein | Zendy

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39‐3: Patternable Color‐conversion Films based on Thick‐shell Quantum Dots

Author(s) -

Lien Jiun-Yi,

Chen Chih-Jung,

Chiang Ray-Kuang,

Wang Sue-Lein

Publication year - 2017

Publication title -

sid symposium digest of technical papers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.351

H-Index - 44

eISSN - 2168-0159

pISSN - 0097-966X

DOI - 10.1002/sdtp.11706

Subject(s) - gamut , photoresist , quantum dot , materials science , brightness , optoelectronics , color filter array , lithography , absorbance , nanoimprint lithography , photolithography , color gel , quantum yield , optics , nanotechnology , fluorescence , fabrication , physics , layer (electronics) , thin film transistor , medicine , alternative medicine , pathology

Thick‐shell quantum dots (QDs) with green and red emission as well as high absorbance values are fabricated and dispersed in a commercial photoresist with density larger than 20 wt %. Such QD‐photoresist composites enable next‐generation displays with high brightness and wide color gamut (> 90 % Rec. 2020 coverage) through traditional lithography process for color filters. The emissive QD‐color filters (QDCFs) with thickness below 6 μm show optical density (O.D.) above 0.9 and film quantum yield reaching 70 %. The patterned QDCFs with 20~40 wt % of QDs reach the minimum line width about 7 μm.

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