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37‐2: Plane Source Evaporation Techniques for Super Ultra High Resolution Flexible AMOLED
Author(s) -
Hwang Changhun,
Kim Sung Su,
Lee Hagwon,
Jo Sung Min,
Chin Byung Doo,
Kong Do-Hoon,
Ju Sung Hoo
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11690
Subject(s) - amoled , materials science , shadow (psychology) , evaporation , plane (geometry) , shadow mask , resolution (logic) , optics , optoelectronics , nanotechnology , physics , computer science , geometry , mathematics , psychology , psychotherapist , thermodynamics , layer (electronics) , active matrix , thin film transistor , artificial intelligence
The vacuum thermal evaporation (VTE) patterning technique using linear type evaporation sources has 3μm of minimum shadow distance so that the high resolution (577ppi, 2K QHD) AMOLED can be manufactured. However, there is a shadow limitation of the neighboring patterns overlapped when manufacturing the ultra‐high resolution (800ppi, 4K UHD) AMOLED. The plane source VTE shows recently of 1.1μm~1.3μm in shadow distance measurements and it verifies the possibility of manufacturing the ultra‐high resolution AMOLEDs with 1000~1500ppi. The shadow angle of 83° and shadow distance of 0.37μm have been predicted from the plane source AFM analysis and, therefore, it shows high possibility of manufacturing the super‐ultra‐high AMOLEDs with 3300ppi. The study of plane source evaporation and its evaporator need to be expanded for the AMOLED futures.