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30‐2: The Crystallization Monitor: Enabling Accurate Metrology of Excimer‐Laser Annealed Si Films
Author(s) -
van der Wilt Paul C.,
Passinger Sven
Publication year - 2017
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11652
Subject(s) - metrology , excimer laser , materials science , laser , optoelectronics , excimer , amoled , crystallization , process (computing) , optics , nanotechnology , computer science , engineering , thin film transistor , chemical engineering , physics , layer (electronics) , active matrix , operating system
The requirements to the quality and uniformity of excimer‐laser annealed Si films has increased significantly with the advent of high‐resolution AMOLED displays. Here, we present a newly developed optical inspection device that enables accurate metrology inside and outside the ELA process chamber.