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P‐143: Fabrication of 5.5‐inch 4K2K Liquid Crystal panel using High‐mobility IGZO Material
Author(s) -
Kurosaki Daisuke,
Nakada Masataka,
Hosaka Yasuharu,
Katayama Masahiro,
Okazaki Kenichi,
Koezuka Junichi,
Shishido Hideaki,
Takahashi Kei,
Toyotaka Kouhei,
Hirakata Yoshiharu,
Yamazaki Shunpei,
Matsuo Takuya,
Oda Akihiro
Publication year - 2016
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.11011
Subject(s) - fabrication , materials science , liquid crystal display , optoelectronics , demultiplexer , semiconductor , oxide , layer (electronics) , indium , crystal (programming language) , nanotechnology , electrical engineering , engineering , metallurgy , computer science , medicine , alternative medicine , pathology , multiplexer , multiplexing , programming language
We have fabricated a 5.5‐inch 4K2K liquid crystal display (LCD) using an oxide semiconductor. The use of an oxide semiconductor layer of a high‐mobility indium‐rich material and a top‐gate structure enables fabrication of a 4K2K LCD with a narrow bezel and an integrated demultiplexer.