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26‐4: Highly Oxidation‐Resistant Mo‐Alloys for Metal‐Oxide TFT Metallization
Author(s) -
Köstenbauer Harald,
Lorenz Dominik,
Winkler Jörg
Publication year - 2016
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.10671
Subject(s) - materials science , ternary operation , oxide , annealing (glass) , metallurgy , metal , diffusion barrier , composite material , layer (electronics) , computer science , programming language
A new set of ternary Mo‐alloys with very high oxidation resistance during annealing in air (up to 400°C) were developed. The new materials exhibit suitable high wet etch rate in a standard Al‐etchant, while maintaining good diffusion barrier properties.
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