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26‐1: Invited Paper : Metal Oxide TFT Turnkey Manufacturing Solution for a‐Si TFT Lines
Author(s) -
Xiao Tian,
Yu Gang,
Shieh ChanLong,
Park JungWoo,
Foong Fatt,
Lee Karman,
Musolf Juergen,
Wang Guangming,
Ottoson Kristoffer,
Yang Kaixia,
Wang Jeff,
Berkoff Bruce,
Nilsson Boo
Publication year - 2016
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.10664
Subject(s) - thin film transistor , upgrade , turnkey , production line , manufacturing engineering , oxide thin film transistor , computer science , materials science , engineering , nanotechnology , telecommunications , operating system , mechanical engineering , layer (electronics)
There is strong incentive to upgrade a‐Si TFT lines with minimal investments to enable high‐end display manufacturing. We developed an oxide TFT manufacturing process which keeps the high‐throughout SiNx GI and wet BCE process used in a‐Si TFT lines, enabling high resolution LCD and OLED display manufacturing with minimal equipment upgrade and production costs.