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65.3: Development of Flexible Displays using Back‐Channel‐Etched In–Sn–Zn–O TFTs and Air‐Stable Inverted OLEDs
Author(s) -
Nakata Mitsuru,
Motomura Genichi,
Nakajima Yoshiki,
Takei Tatsuya,
Tsuji Hiroshi,
Fukagawa Hirohiko,
Shimizu Takahisa,
Tsuzuki Toshimitsu,
Fujisaki Yoshihide,
Shimidzu Naoki,
Yamamoto Toshihiro
Publication year - 2015
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.10281
Subject(s) - oled , passivation , materials science , layer (electronics) , optoelectronics , channel (broadcasting) , thin film transistor , nanotechnology , computer science , telecommunications
Flexible displays using back‐channel‐etched In–Sn–Zn–O (ITZO) TFTs and air‐stable OLEDs were developed. The TFTs with a solution‐processed passivation layer exhibited a high mobility (31.4 cm 2 /Vs) and high stability. ITZO was also used as an electron injection layer in the OLEDs instead of air‐sensitive materials.