Open AccessObservation of current‐density filamentation in multilayer structures by EBIC measurements
Author(s) -
Wierschem A.,
Niedernostheide F.J.,
Gorbatyuk A.,
Purwins H.G.
Publication year - 1995
Publication title -
scanning
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.359
H-Index - 47
eISSN - 1932-8745
pISSN - 0161-0457
DOI - 10.1002/sca.4950170207
Subject(s) - filamentation , electric field , electron beam induced current , diode , current density , current (fluid) , cathode ray , materials science , spreading resistance profiling , electron , optics , voltage , optoelectronics , physics , scanning electron microscope , laser , doping , quantum mechanics , thermodynamics
The total current‐voltage characteristics of the p + ‐n + ‐p‐n − and n + ‐p‐n‐p − diodes under investigation show branches of negative differential resistance. Accompanied by the appearance of negative differential resistance is a filamentation of current‐density and electric‐field distribution. Electron beam‐induced current (EBIC) measurements were used to examine the properties of filamentation from the point of view of self‐organized pattern formation. Besides the detection of the spatial distribution of the electric field, EBIC measurements give information on current‐density filamentation. Furthermore, the perturbation by the electron beam gives information on the dynamic behavior of the filamentary structure.