Open AccessConditions for voltage contrast observation over passivated devices
Author(s) -
Kodama T.,
Koyama N.,
Uchikawa Y.
Publication year - 1991
Publication title -
scanning
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.359
H-Index - 47
eISSN - 1932-8745
pISSN - 0161-0457
DOI - 10.1002/sca.4950130104
Subject(s) - passivation , scanning electron microscope , secondary electrons , materials science , voltage , cathode ray , electron , acceleration voltage , optoelectronics , electron beam processing , irradiation , layer (electronics) , electron microscope , nanotechnology , optics , composite material , electrical engineering , physics , engineering , quantum mechanics , nuclear physics
Inspection of passivated microdevices using the scanning electron microscope (SEM) at a low primary electron energy has been increasingly studied. Previously we reported an empirical formula for conditions under which SEM observations over the passivation layer can be made without inducing serious charging disturbances. An investigation of charge balance between primary and secondary electrons was presented. The present work investigates the charging disturbance‐free conditions of PSG, SiN, and Si 3 N 4 passivated devices and how they are affected by beam irradiation. The storage time of the voltage contrast is measured for various values of primary electron energy and incident angle.