Open AccessDetectable resistance in electron beam testing of wiring networks
Author(s) -
Brunner M.
Publication year - 1984
Publication title -
scanning
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.359
H-Index - 47
eISSN - 1932-8745
pISSN - 0161-0457
DOI - 10.1002/sca.4950060105
Subject(s) - cathode ray , capacitance , electron , beam (structure) , materials science , limit (mathematics) , optoelectronics , electrical engineering , computer science , physics , optics , engineering , mathematics , nuclear physics , mathematical analysis , electrode , quantum mechanics
Electron beam testing of wiring and packaging modules allows detection of high resistance shorts between networks up to resistances which may be well above 1 GΩ. The detection of low resistance defects is limited by electron beam currents, network capacitance, and testing time. The dependence of the smallest detectable resistance on technical parameters is discussed for three proposed test techniques employing one or two electron beams. The detection limit is estimated for a realistic case to be between 5MΩ and 10 MΩ.