Open AccessNanostructured vanadium carbide thin films produced by RF magnetron sputtering
Author(s) -
Pat Suat,
Korkmaz Şadan
Publication year - 2015
Publication title -
scanning
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.359
H-Index - 47
eISSN - 1932-8745
pISSN - 0161-0457
DOI - 10.1002/sca.21199
Subject(s) - materials science , refractive index , wetting , thin film , vanadium carbide , contact angle , microstructure , vanadium , sputter deposition , sputtering , surface energy , carbide , analytical chemistry (journal) , optics , composite material , optoelectronics , nanotechnology , metallurgy , chemistry , physics , chromatography
Summary In this paper, nanostructured vanadium carbide thin films were deposited on glass substrates and their optical and surface properties were analyzed. All produced samples were transparent in the optical region. Refractive index values were calculated using the Drude model. According to contact angle measurements of the coated surfaces, the samples show high wettability. The surface free energies of the samples were found to be very similar. The influence of the nitrogen content in the buffer gas mixture was determined; it was concluded that the microstructure, refractive index, surface morphology, surface free energy, and thickness of thin films can change in response to the nitrogen concentration of the radio frequency (RF) buffer gas. SCANNING 37:197–203, 2015. © 2015 Wiley Periodicals, Inc.