Open AccessA simple method for the removal of thiols on gold surfaces using an NH 4 OH–H 2 O 2 –H 2 O solution
Author(s) -
Kim Dae Jung,
Pitchimani Rajasekar,
Snow David E.,
HopeWeeks Louisa J.
Publication year - 2008
Publication title -
scanning
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.359
H-Index - 47
eISSN - 1932-8745
pISSN - 0161-0457
DOI - 10.1002/sca.20089
Subject(s) - chemistry , monolayer , thiol , substrate (aquarium) , analytical chemistry (journal) , nuclear chemistry , inorganic chemistry , chromatography , organic chemistry , biochemistry , oceanography , geology
The removal behavior of self‐assembled monolayers (SAMs) of thiol molecules on a gold substrate by an NH 4 OH–H 2 O 2 –H 2 O solution was studied using attenuated total reflectance infrared spectroscopy (ATR‐IR) and atomic force microscopy (AFM). Furthermore, the impact of the concentration of NH 4 OH and H 2 O 2 in the solution and reaction temperature on the SAM removal rate and efficiency was explored. The SAM removal rate and efficiency were significantly influenced by the concentration of NH 4 OH rather than H 2 O 2 . The solution containing the 2 : 1 molar ratio of NH 4 OH : H 2 O 2 among three different solutions showed the highest removal rate and efficiency in the removal of 11‐mercapto‐1‐undecanol. The increase in the reaction temperature resulted in the enhancement on the SAM removal rate, but it led to the fast delamination of the gold layer. These results may be useful in the regeneration of sensor surfaces relying on gold/thiol chemistry. SCANNING 30: 000–000, 2008. © 2008 Wiley Periodicals, Inc.