Open AccessNew expressions for angular distributions
Author(s) -
Klein P.,
Andrae M.,
Röhrbacher K.,
Wernisch J.
Publication year - 1996
Publication title -
scanning
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.359
H-Index - 47
eISSN - 1932-8745
pISSN - 0161-0457
DOI - 10.1002/sca.1996.4950180604
Subject(s) - monte carlo method , scattering , electron , path (computing) , physics , reflection (computer programming) , computational physics , electron scattering , distribution (mathematics) , forward scatter , elongation , mean free path , angle of incidence (optics) , optics , mathematical analysis , mathematics , materials science , quantum mechanics , statistics , computer science , metallurgy , ultimate tensile strength , programming language
An electron scattering model (multiple reflections) based on physical quantities only is refined and extended. New expressions for the most probable scattering angle, for the angular distribution of transmitted electrons, and for the angular distribution of backscattered electrons under oblique incidence, derived by fitting to already published data or to Monte Carlo results, are presented and compared with well‐established formulae. The mean path‐elongation factor for a multiple reflection model is calculated by introducing a correlation of angular distributions. The value of the new path elongation factor is compared with already existing fits.