z-logo
Premium
Optimal pressure conditions for unbiased external ion accumulation in a two‐dimensional radio‐frequency quadrupole for Fourier transform ion cyclotron resonance mass spectrometry
Author(s) -
Belov Mikhail E.,
Gorshkov Michael V.,
Alving Kim,
Smith Richard D.
Publication year - 2001
Publication title -
rapid communications in mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.528
H-Index - 136
eISSN - 1097-0231
pISSN - 0951-4198
DOI - 10.1002/rcm.459
Subject(s) - fourier transform ion cyclotron resonance , chemistry , ion cyclotron resonance , ion , mass spectrometry , fourier transform , quadrupole , selected ion monitoring , analytical chemistry (journal) , fourier transform spectroscopy , cyclotron , atomic physics , nuclear magnetic resonance , physics , chromatography , gas chromatography–mass spectrometry , organic chemistry , quantum mechanics , infrared spectroscopy
When combined with on‐line separations (e.g., capillary liquid chromatography (LC)), Fourier transform ion cyclotron resonance mass spectrometry (FTICR‐MS) provides a powerful tool for biological applications, and particularly proteomic studies. The sensitivity, dynamic range, and duty cycle provided by FTICR‐MS have been shown to be increased by ion trapping and accumulation in a two‐dimensional (2D) radio‐frequency (rf)‐only multipole positioned externally to an FTICR cell. However, it is important that ions be detected across the desired m/z range without a significant bias. In this work we found that pressure inside the accumulation rf‐quadrupole plays an important role in obtaining ‘unbiased’ ion accumulation. Pressure optimization was performed in both pulsed and continuous modes. It was found that unbiased accumulation in a 2D rf‐only quadrupole could be achieved in the pressure range of 5 × 10 −4 to 5 × 10 −3 Torr. External ion accumulation performed at the optimal pressure resulted in an increase in both the spectrum acquisition rates and dynamic range. Copyright © 2001 John Wiley & Sons, Ltd.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here