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Enhanced surface sensitivity in secondary ion mass spectrometric analysis of organic thin films using size‐selected Ar gas‐cluster ion projectiles
Author(s) -
Tanaka Motohiro,
Moritani Kousuke,
Hirota Tomokazu,
Toyoda Noriaki,
Yamada Isao,
Inui Norio,
Mochiji Kozo
Publication year - 2010
Publication title -
rapid communications in mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.528
H-Index - 136
eISSN - 1097-0231
pISSN - 0951-4198
DOI - 10.1002/rcm.4529
Subject(s) - chemistry , secondary ion mass spectrometry , analytical chemistry (journal) , x ray photoelectron spectroscopy , sputtering , static secondary ion mass spectrometry , ion beam , ion , argon , mass spectrum , thin film , mass spectrometry , ion beam deposition , cluster (spacecraft) , nanotechnology , materials science , nuclear magnetic resonance , chromatography , physics , organic chemistry , computer science , programming language
A size‐selected argon (Ar) gas‐cluster ion beam (GCIB) was applied to the secondary ion mass spectrometry (SIMS) of a 1,4‐didodecylbenzene (DDB) thin film. The samples were also analyzed by SIMS using an atomic Ar + ion projectile and X‐ray photoelectron spectroscopy (XPS). Compared with those in the atomic‐Ar + SIMS spectrum, the fragment species, including siloxane contaminants present on the sample surface, were enhanced several hundred times in the Ar gas‐cluster SIMS spectrum. XPS spectra during beam irradiation indicate that the Ar GCIB sputters contaminants on the surface more effectively than the atomic Ar + ion beam. These results indicate that a large gas‐cluster projectile can sputter a much shallower volume of organic material than small projectiles, resulting in an extremely surface‐sensitive analysis of organic thin films. Copyright © 2010 John Wiley & Sons, Ltd.