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Experimental apparatus for investigation of sputtering and secondary ion emission induced by energetic ion beams
Author(s) -
Drozdziel A.,
Pyszniak K.,
Sielanko J.,
Turek M.,
Wójtowicz A.
Publication year - 2005
Publication title -
rapid communications in mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.528
H-Index - 136
eISSN - 1097-0231
pISSN - 0951-4198
DOI - 10.1002/rcm.2306
Subject(s) - chemistry , sputtering , ion , separator (oil production) , quadrupole mass analyzer , mass spectrometry , ion beam , secondary ion mass spectrometry , irradiation , quadrupole , atomic physics , analytical chemistry (journal) , nuclear physics , thin film , physics , nanotechnology , materials science , thermodynamics , organic chemistry , chromatography
The construction of an experimental apparatus, for investigation of implantation, secondary ion emission and sputtering processes, during irradiation of samples with an ion beam of up to 70 keV energy, is described. The basis of the apparatus is an electromagnetic mass separator equipped with a quadrupole mass spectrometer located in the collector chamber. The computer data acquisition control system makes it possible to perform the experimental measurements with high accuracy and precision. Preliminary results of secondary ion mass spectral measurements, obtained for C, Al, Si and Cu targets bombarded with Ar + and Kr + ions, are presented. Copyright © 2005 John Wiley & Sons, Ltd.