Premium
Secondary ion mass spectrometry and X‐ray photoelectron spectroscopy investigation on chemical vapor deposited CeO 2 ZrO 2 TiO 2 thin films
Author(s) -
Barison Simona,
Barreca Davide,
Battiston Giovanni A.,
Daolio Sergio,
Fabrizio Monica,
Gerbasi Rosalba,
Tondello Eugenio
Publication year - 2003
Publication title -
rapid communications in mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.528
H-Index - 136
eISSN - 1097-0231
pISSN - 0951-4198
DOI - 10.1002/rcm.1014
Subject(s) - x ray photoelectron spectroscopy , secondary ion mass spectrometry , chemistry , thin film , chemical vapor deposition , analytical chemistry (journal) , scanning electron microscope , mass spectrometry , chemical engineering , nanotechnology , materials science , composite material , organic chemistry , chromatography , engineering
Mixed CeO 2 ZrO 2 systems have attracted widespread interest for their use in three‐way catalyst (TWC) technology for automotive exhaust conversion to non‐toxic products. In this work, CeO 2 ZrO 2 thin films were deposited, via chemical vapor deposition, in order to obtain nanoscale materials with a high surface‐to‐volume ratio, with precise control of system properties. The addition of TiO 2 as buffer layer was also investigated. Cordierite was chosen as substrate, being the usual refractory material for catalytic mufflers. The multilayers were characterized by scanning electron microscopy, X‐ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). In particular, the combination of SIMS and XPS allowed us to investigate both surface and in‐depth chemical composition, studying also film‐intermixing phenomena induced by annealing processes. Copyright © 2003 John Wiley & Sons, Ltd.