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Rules of electron correlation energies of van der Waals' complexes RgX (Rg = Ar, Kr, X = F, Cl, Br)
Author(s) -
Wei Jichong,
Zhuo Shuping,
Ju Guanzhi
Publication year - 2003
Publication title -
international journal of quantum chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.484
H-Index - 105
eISSN - 1097-461X
pISSN - 0020-7608
DOI - 10.1002/qua.10787
Subject(s) - van der waals force , atom (system on chip) , atomic physics , electronic correlation , chemistry , electron , basis (linear algebra) , krypton , physics , molecule , quantum mechanics , argon , mathematics , organic chemistry , computer science , embedded system , geometry
First, the intrapair and interpair correlation energies of the Rg atom, X atom, and the optimized RgX (Rg = Ar, Kr, X = F, Cl, Br) complexes are calculated by the MELD program at the 6‐311++g( d ), 6‐311++g(3 df , 3 pd ), and cc‐pvqz basis sets (denoted by basis sets a, b, and c, respectively). It is found that the relationship E corr (RgX) ≈ E corr (Rg) + E corr (X) is correct for all the above systems but introducing an unsound absolute error for some RgX systems. Second, the same calculations are selectively carried out for ArF (the smallest system) and KrBr (the largest system) at their increasing interatomic distance. It was found that both the correlation energies of ArF and those of KrBr will decrease whenever the interatomic distance of them become larger. On the basis of our results, we provided an approach to quickly estimate the correlation energies of RgX complexes by which not only the absolute error becomes smaller but more computation work is saved than the direct calculation. © 2003 Wiley Periodicals, Inc. Int J Quantum Chem, 2004