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in situ failure detection in thick film multilayer systems
Author(s) -
Manca J.,
de Schepper L.,
de Ceuninck W.,
D'Olieslaeger M.,
Stals L. M.
Publication year - 1995
Publication title -
quality and reliability engineering international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 62
eISSN - 1099-1638
pISSN - 0748-8017
DOI - 10.1002/qre.4680110416
Subject(s) - in situ , materials science , reliability engineering , computer science , engineering , physics , meteorology
By means of in situ e.m.f.‐measurements, leakage current measurements and impedance spectroscopy, it has been possible for the first time to detect spontaneous and forced blistering in thick film multilayers during formation at high temperatures. Also the occurrence of high temperature shorts in Ag‐dielectric‐Ag multilayers under DC‐bias was detectable.