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Voltage contrast studies on 0·5 μm integrated circuits by scanning force microscopy
Author(s) -
Böhm Christoph,
Sprengepiel Jörg,
Kubalek Erich
Publication year - 1995
Publication title -
quality and reliability engineering international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 62
eISSN - 1099-1638
pISSN - 0748-8017
DOI - 10.1002/qre.4680110407
Subject(s) - voltage , waveform , materials science , electronic circuit , contrast (vision) , integrated circuit , microscope , microscopy , scanning probe microscopy , optics , optoelectronics , engineering , electrical engineering , physics
A scanning force microscope (SFM) test system is used for voltage contrast studies on 0·5 μm integrated circuits. Waveform measurements are performed on passivated 0·5 μm conducting lines up to 4 GHz. Additionally two‐dimensional measurements at 10 MHz demonstrate the potential for device internal function and failure analysis in the sub‐μm regime by direct correlation between voltage contrast and quantitative topography images.