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Robust design of a polysilicon deposition process using split‐plot analysis
Author(s) -
Cantell Brenda S.,
Ramírez José G.
Publication year - 1994
Publication title -
quality and reliability engineering international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 62
eISSN - 1099-1638
pISSN - 0748-8017
DOI - 10.1002/qre.4680100207
Subject(s) - plot (graphics) , noise (video) , split plot , computer science , design of experiments , process (computing) , raw data , electronic engineering , engineering , statistics , mathematics , artificial intelligence , randomized block design , image (mathematics) , operating system , programming language
The technique used for the analysis of experimental data must be appropriate for the design and treatment structures of the experiment; failure to take this into account can produce misleading results. This paper illustrates how split‐plot designs can be used for the analysis of robust design experiments. In particular, the polysilicon deposition process data presented by Phadke 1 is analysed, and comparisons are made between the split‐plot analysis of the raw data and the analysis conducted using signal‐to‐noise ratios. In addition, we demonstrate how the split‐plot analysis provides information about interactions between control and noise factors, and how interaction plots can be used to assess the performance of the control factors across the levels of the noise factors. This information is particularly important to select the settings of the control factors that minimize the variation in the response induced by the noise factors.