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Performance of customized control charts to detect process disturbances
Author(s) -
HerediaLangner Alejandro,
Montgomery Douglas C.,
Runger George C.,
Borror Connie M.,
Post Richard I.
Publication year - 2001
Publication title -
quality and reliability engineering international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 62
eISSN - 1099-1638
pISSN - 0748-8017
DOI - 10.1002/qre.390
Subject(s) - control chart , statistical process control , shewhart individuals control chart , process (computing) , computer science , contrast (vision) , semiconductor device fabrication , ewma chart , control (management) , manufacturing process , process capability , engineering , statistics , industrial engineering , data mining , work in process , artificial intelligence , mathematics , operations management , materials science , wafer , electrical engineering , composite material , operating system
In this paper we demonstrate the use of control charts based on orthogonal contrasts for a semiconductor manufacturing process. The statistical performance of individuals control charts based on these contrasts and their exponentially weighted moving average counterparts is compared to that of the traditional approach. Contrast‐based charts have superior detection capabilities than the traditional approach when targeted at specific process disturbances. Copyright © 2001 John Wiley & Sons, Ltd.