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Process Yield for Multivariate Linear Profiles with One‐sided Specification Limits
Author(s) -
Wang FuKwun,
Tamirat Yeneneh
Publication year - 2016
Publication title -
quality and reliability engineering international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.913
H-Index - 62
eISSN - 1099-1638
pISSN - 0748-8017
DOI - 10.1002/qre.1834
Subject(s) - multivariate statistics , process capability , measure (data warehouse) , process capability index , normality , multivariate analysis , process (computing) , multivariate normal distribution , computer science , statistics , mathematics , data mining , work in process , engineering , operating system , operations management
The new investigation of profile monitoring is focused mainly on a process with multiple quality characteristics. Process yield has been used widely in the manufacturing industry, as an index for measuring process capability. In this study, we present two indices C p u A T and C p l A T to measure the process capability for multivariate linear profiles with one‐sided specification limits under mutually independent normality. Additionally, two indices C p u A ; P C T and C p l A ; P C T are proposed to measure the process capability for multivariate linear profiles with one‐sided specification limits under multivariate normality. These indices can provide an exact measure of the process yield. The approximate normal distributions for C p u A T and C p l A T are constructed. A simulation study is conducted to assess the performance of the proposed approach. The simulation results show that the estimated value of C p u A T performs better as the number of profiles increases. Two illustrative examples are used to demonstrate the applicability of the proposed approach. Copyright © 2015 John Wiley & Sons, Ltd.