All‐Solution‐Processed Micro/Nanowires with Electroplate Welding as Transparent Conducting Electrodes

In article no. 1900010 , Chaobin Yang, Michael J. Naughton and co‐workers demonstrate two variants of an all‐solution method to produce silver micro/nanowire films as transparent conductors. By integrating crackle photolithography‐based microwires with nanowires and electroplate welding, the authors obtain transparent conductors with low sheet resistance (<1 ohm/sq.), high optical transmittance (>80%) and small domain size (∼10 μm2). It is shown that the samples can be transferred to flexible substrates, making a possible cost‐effective candidate for flexible applications. The cover picture shows a photograph of an all‐solution‐processed micro/nanowire transparent conducting electrode on 100 mmdiameter glass, held in front of a building. Bottom left: Scanning electron microscopy (SEM) image of the silver micro/ nanowires, bottom right: SEM of a junction between two nanowires after electroplating.