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Enhancement‐Mode β ‐Ga 2 O 3 Metal‐Oxide‐Semiconductor Field‐Effect Transistor with High Breakdown Voltage over 3000 V Realized by Oxygen Annealing
Author(s) -
Lv Yuanjie,
Zhou Xingye,
Long Shibing,
Wang Yuangang,
Song Xubo,
Zhou Xuanze,
Xu Guangwei,
Liang Shixiong,
Feng Zhihong,
Cai Shujun,
Fu Xingchang,
Pu Aimin,
Liu Ming
Publication year - 2020
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201900586
Subject(s) - materials science , threshold voltage , transistor , optoelectronics , field effect transistor , passivation , annealing (glass) , mosfet , gate oxide , breakdown voltage , oxide , voltage , electrical engineering , layer (electronics) , nanotechnology , metallurgy , engineering
Herein, high‐performance enhancement‐mode (E‐mode) β ‐Ga 2 O 3 metal‐oxide‐semiconductor field‐effect transistors (MOSFETs) are achieved on Si‐doped homoepitaxial films. Oxygen annealing (OA) treatment under the gate region is used to effectively exhaust the channel electron, resulting in the normally off operation of the device. The threshold voltage, defined as that at the drain current of 0.1 mA mm −1 , for the fabricated device is extracted to be 4.1 V. Moreover, double source‐connected field plates are used to suppress the peak electric fields in both Ga 2 O 3 channel and SiN x passivation layer. The fabricated β ‐Ga 2 O 3 MOSFETs with gate‐to‐drain distance ( L gd ) of 17 μm exhibit a record high breakdown voltage over 3000 V. It is shown that the OA treatment is a new way to obtain high‐performance E‐mode β ‐Ga 2 O 3 power MOSFETs.