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Multiwavelength Raman Scattering Spectroscopy Study of Graphene Synthesized on Si(100) and SiO 2 by Microwave Plasma‐Enhanced Chemical Vapor Deposition
Author(s) -
Meškinis Šarūnas,
Gudaitis Rimantas,
Vasiliauskas Andrius,
Tamulevičius Sigitas,
Niaura Gediminas
Publication year - 2020
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201900462
Subject(s) - raman spectroscopy , graphene , chemical vapor deposition , materials science , plasma enhanced chemical vapor deposition , substrate (aquarium) , full width at half maximum , analytical chemistry (journal) , crystallite , raman scattering , spectroscopy , ultraviolet , infrared , microwave , optoelectronics , optics , chemistry , nanotechnology , physics , oceanography , chromatography , quantum mechanics , geology , metallurgy
Herein, multiwavelength Raman spectroscopy studies of graphene samples synthesized directly on SiO 2 and Si(100) substrates by microwave plasma‐enhanced chemical vapor deposition (MW PECVD), using five different excitation wavelengths in ultraviolet (UV), visible light, and near‐infrared (NIR) ranges, are presented paying attention to the peculiarities of the spectra. Raman spectra parameters are analyzed to reveal effects of the excitation wavelength. Structural features of graphene directly synthesized on SiO 2 and Si(100) are discussed. Analysis of the interdependences of various Raman spectra parameters reveals that the most informative spectra are recorded using 532 nm wavelength excitation. Examination of the full width at half maximum values of G band (FWHM(G)) reveals that the graphene layers synthesized on Si(100) substrate consist of smaller crystallites comparing with SiO 2 substrate.