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2D MoSe 2 Structures Prepared by Atomic Layer Deposition
Author(s) -
Krbal Milos,
Prikryl Jan,
Zazpe Raul,
Dvorak Filip,
Bures Filip,
Macak Jan M.
Publication year - 2018
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201800023
Subject(s) - x ray photoelectron spectroscopy , raman spectroscopy , scanning electron microscope , materials science , layer (electronics) , deposition (geology) , crystallography , spectroscopy , analytical chemistry (journal) , diffraction , powder diffraction , atomic layer deposition , chemical engineering , nanotechnology , chemistry , optics , organic chemistry , composite material , paleontology , physics , quantum mechanics , sediment , engineering , biology
Here, we demonstrate the preparation of 2D MoSe 2 structures by the atomic layer deposition technique. In this work, we use ((CH 3 ) 3 Si) 2 Se as the Se precursor and Mo(CO) 6 or MoCl 5 as the Mo precursors. The X‐ray photoelectron spectroscopy (XPS) analyses of the prepared samples have revealed that using the MoCl 5 precursor the obtained structure of MoSe 2 is nearly identical to the reference powder MoSe 2 sample while the composition of the sample prepared from Mo(CO) 6 contains a significant amount of oxygen atoms. Further inspection of as‐deposited samples via scanning electron microscopy (SEM), X‐ray diffraction (XRD), and Raman spectroscopy has disclosed that the MoSe 2 structure based on MoCl 5 is formed from randomly oriented well crystalline flakes with their size ≈100 nm in contrast to the Mo–Se–O compact film originating from Mo(CO) 6 .