Premium
Synthesis of tin oxides SnO 2– x in the entire composition range ( x = 0 to 1) by ion‐beam sputter‐deposition
Author(s) -
Becker Martin,
Polity Angelika,
Klar Peter J.,
Meyer† Bruno K.
Publication year - 2015
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201510058
Subject(s) - tin , deposition (geology) , sputtering , raman spectroscopy , substrate (aquarium) , analytical chemistry (journal) , materials science , ion beam , tin oxide , thin film , oxide , ion , mineralogy , chemistry , metallurgy , nanotechnology , optics , geology , oceanography , physics , organic chemistry , chromatography , sediment , paleontology
Ion‐beam sputter‐deposition (IBSD) was used to reactively deposit tin oxide crystalline films at oxygen fluxes of 3–15 sccm and at substrate temperatures of 100–600 °C. Analysing the samples by X‐ray diffraction and Raman spectro‐ scopy yields a map of the crystalline structures in dependence on the growth parameters. In addition to SnO 2 , pure SnO films of high quality and an intermediate phase such as Sn 2 O 3 or Sn 3 O 4 can be reproducibly obtained. Thus, IBSD is, to our knowledge, the only thin‐film deposition technique verified yet to reliably produce samples in the entire composition range of tin oxides. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)