z-logo
Premium
Additive advantage in characteristics of MIMCAPs on flexible silicon (100) fabric with release‐first process
Author(s) -
Ghoneim Mohamed T.,
Rojas Jhonathan P.,
Hussain Aftab M.,
Hussain Muhammad M.
Publication year - 2014
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201308209
Subject(s) - materials science , wafer , silicon , tantalum nitride , silicon on insulator , atomic layer deposition , optoelectronics , dram , planar , capacitance , nanotechnology , silicon nitride , fabrication , dynamic random access memory , capacitor , aluminium , layer (electronics) , electrode , electrical engineering , composite material , voltage , computer science , chemistry , computer graphics (images) , alternative medicine , semiconductor memory , pathology , engineering , medicine
We report the inherent increase in capacitance per unit planar area of state‐of‐the art high‐ κ integrated metal/insulator/metal capacitors (MIMCAPs) fabricated on flexible silicon fabric with release‐first process. We methodically study and show that our approach to transform bulk silicon (100) into a flexible fabric adds an inherent advantage of enabling higher integration density dynamic random access memory (DRAM) on the same chip area. Our approach is to release an ultra‐thin silicon (100) fabric (25 µm thick) from the bulk silicon wafer, then build MIMCAPs using sputtered aluminium electrodes and successive atomic layer depositions (ALD) without break‐ing the vacuum of a high‐ κ aluminium oxide sandwiched between two tantalum nitride layers. This result shows that we can obtain flexible electronics on silicon without sacrificing the high density integration aspects and also utilize the non‐planar geometry associated with fabrication process to obtain a higher integration density compared to bulk silicon integration due to an increased normalized capacitance per unit planar area. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here