z-logo
Premium
Effect of nitrogen doping on the thermal conductivity of GeTe thin films
Author(s) -
Fallica Roberto,
Varesi Enrico,
Fumagalli Luca,
Spadoni Simona,
Longo Massimo,
Wiemer Claudia
Publication year - 2013
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201308026
Subject(s) - thermal conductivity , materials science , amorphous solid , doping , thin film , stoichiometry , conductivity , nitrogen , phase (matter) , thermal , interfacial thermal resistance , analytical chemistry (journal) , composite material , thermal resistance , nanotechnology , thermodynamics , chemistry , crystallography , optoelectronics , physics , organic chemistry , chromatography
The 3 ω method was employed to determine the effect of nitrogen doping (5 at.%) on the thermal conductivity of sputtered thin films of stoichiometric GeTe (a material of interest for phase change memories). It was found that nitrogen doping has a detrimental effect on the thermal conductivity of GeTe in both phases, but less markedly in the amorphous (–25%) than in the crystalline one (–40%). On the opposite, no effect could be detected on the measured thermal boundary resistance between these films and SiO 2 , within the experimental error. Our results agree with those obtained by molecular dynamic simulation of amorphous GeTe. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom