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Micro gratings written in ZnO:Al thin films using picosecond UV‐laser interference patterning
Author(s) -
Ring Sven,
Stannowski Bernd,
Fink Frank,
Schlatmann Rutger
Publication year - 2013
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201307254
Subject(s) - materials science , grating , optics , transmittance , diffraction grating , optoelectronics , picosecond , laser , thin film , groove (engineering) , diffraction , nanotechnology , physics , metallurgy
Diffraction micro gratings have been written in ZnO:Al thin films using a picosecond laser operating at 355 nm. Micro gratings of 20 µm diameter with a period of 860 nm show a groove depth up to 120 nm. The total transmittance of square‐centimeter‐size grating‐textured ZnO:Al films was almost unchanged after grating formation, while the sheet resistance increased moderately. The textured films reached haze values of 9% at 700 nm. This simple texturing method can be applied also to ZnO:Al films that cannot be texture etched.Illustration of the interfering laser beams and the resulting micro grating (left) and reflection from a micro grating array written in ZnO:Al on glass (right). (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)