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Large‐area fabrication of equidistant free‐standing Si crystals on nanoimprinted glass
Author(s) -
Sontheimer Tobias,
RudigierVoigt Eveline,
Bockmeyer Matthias,
Klimm Carola,
SchubertBischoff Peter,
Becker Christiane,
Rech Bernd
Publication year - 2011
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201105437
Subject(s) - fabrication , materials science , equidistant , nanoimprint lithography , lithography , amorphous solid , nanotechnology , photonic crystal , evaporation , optoelectronics , chemistry , crystallography , medicine , geometry , mathematics , alternative medicine , physics , pathology , thermodynamics
By combining nanoimprint lithography with the emerging high‐rate deposition technique electron‐beam evaporation of amorphous Si, we developed a low‐cost fabrication process for the design of periodic arrays of Si crystals on large areas of 50 cm 2 in a solid phase crystallization and subsequent selective etch process. The method allows for precise control over the feature size of the crystals. The promising absorption properties of the features and the versatility and simplicity of the preparation process inspire the development of three‐dimensional solar cell architectures and tailored large‐area photonic crystals.Cross‐sectional SEM image of periodic arrays of Si crystals on nanoimprinted glass (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)