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Cover Picture: Phys. Status Solidi RRL 1–2/2010
Publication year - 2010
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201090000
Subject(s) - electroforming , cover (algebra) , computer science , nanotechnology , materials science , computer graphics (images) , physics , engineering physics , engineering , mechanical engineering , layer (electronics)
Combining delamination technique with conductive AFM, researchers at Forschungszentrum Jülich and Hewlett–Packard Labs have been able to directly investigate the inside of a TiO 2 memristive junction and to reveal spatially resolved structural and conductance changes after electroforming and switching. The cover figure shows the I – V data of the electrical treatment of such a device as well as the AFM image of its surface after removal of the top electrode. While electroforming results in the creation of a pronounced crater structure with a localized conductance channel, the switching step causes an additional conducting structure next to the forming spot. These microscopic observations provide necessary insights for a better clarification of the electroforming and switching mechanisms. Read on in the Rapid Research Letter on p. 16.