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Thin tantalum films on crystalline silicon – a metallic glass
Author(s) -
Stella Kevin,
Bürstel Damian,
Hasselbrink Eckart,
Diesing Detlef
Publication year - 2011
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.201004510
Subject(s) - tantalum , materials science , amorphous solid , annealing (glass) , silicon , amorphous metal , thin film , vacuum evaporation , diffraction , amorphous silicon , analytical chemistry (journal) , evaporation , crystalline silicon , crystallography , metallurgy , nanotechnology , optics , chemistry , thermodynamics , physics , chromatography
Thin amorphous tantalum films are prepared on Si(111) substrates in a metallic glassy state. The amorphous monoatomic state of the film is characterized by X‐ray diffraction studies. The glassy state leads to a negative t emperature c oefficient of the r esistivity (TCR) for low sample temperatures <200 K which is attributed to incipient localization. Above 200 K a positive TCR is observed as expected for a normal Boltzmann transport regime. Upon heating the Si substrate to 1200 K TaSi 2 is formed out of the amorphous tantalum film and the silicon substrate. The TaSi 2 layer is crystalline as evident from X‐ray diffraction data.Schematic drawing of the evaporation setup on either glass or silicon samples. Scheme of annealing effects. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)