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Microfabrication of freestanding porous silicon particles containing spectral barcodes
Author(s) -
Meade Shawn O.,
Sailor Michael J.
Publication year - 2007
Publication title -
physica status solidi (rrl) – rapid research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.786
H-Index - 68
eISSN - 1862-6270
pISSN - 1862-6254
DOI - 10.1002/pssr.200600077
Subject(s) - porous silicon , microfabrication , materials science , silicon , substrate (aquarium) , scanning electron microscope , photoresist , electropolishing , nanotechnology , porosity , chemical engineering , etching (microfabrication) , optoelectronics , composite material , fabrication , electrolyte , chemistry , electrode , medicine , oceanography , alternative medicine , pathology , layer (electronics) , engineering , geology
A method to microfabricate micron‐scale freestanding porous silicon photonic crystal particles is described. An electrochemically prepared film of porous silicon on a crystalline silicon substrate is patterned with an SU8‐25 photoresist, and the unmasked porous silicon is removed with a chlorine plasma reactive ion etch. Porous microparticles are then removed from the substrate by electropolishing. Scanning electron microscopy and microscopic reflection spectroscopy are used to characterize the geometry and optical properties of the freestanding particles. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)