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Bond distribution and structure of amorphous germanium‐nitrogen alloys
Author(s) -
Zanatta A. R.,
Chambouleyron I.
Publication year - 1996
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2221930214
Subject(s) - x ray photoelectron spectroscopy , germanium , amorphous solid , chemical bond , analytical chemistry (journal) , stoichiometry , materials science , nitrogen , bond length , crystallography , chemistry , nuclear magnetic resonance , crystal structure , metallurgy , silicon , physics , organic chemistry
The Ge 3d core levels of sub‐stoichiometric amorphous germanium‐nitrogen (a‐GeN) alloys are studied by X‐ray photoelectron spectroscopy (XPS). The nitrogen concentration in the samples, as determined from nuclear reaction analysis (NRA), is allowed to vary from zero to ∼ 3 × 10 22 atoms cm −3 . For the whole series of samples both, the chemical shift and the bonding distribution are studied as a function of the nitrogen concentration in the alloys. The chemical shift per Ge‐N bond is also investigated using different methods to deconvolute core level energy spectra, and found to be approximately (0.5 ± 0.1) eV. Furthermore, the present study shows that the GeN bond distribution, as obtained from the analysis of Ge 3d core level data, is in relatively good agreement with the random bonding model (RBM).

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