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Magnetoresistance in NiFebCo/Cu/Co/Cu Multilayers
Author(s) -
Miyazaki T.,
Oikawa M.,
Ishio S.
Publication year - 1993
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2221780221
Subject(s) - magnetoresistance , materials science , electron beam physical vapor deposition , excitation , evaporation , magnon , copper , condensed matter physics , atmospheric temperature range , giant magnetoresistance , analytical chemistry (journal) , thin film , metallurgy , ferromagnetism , chemistry , magnetic field , nanotechnology , thermodynamics , physics , quantum mechanics , chromatography
Multilayer films of glass/[3 nm NiFeCo/ d Cu Cu/3 nm Co] 10 , d Cu = 0.5 to 24 nm are prepared by an electron beam evaporation method under a pressure of ≈ 1.3 × 10 −4 Pa. The magnetoresistance for these multilayers is investigated in the temperature range between 4.2 and 300 K. The temperature dependence of magnetoresistance is discussed based on the model of thermal excitation of magnons and also the two‐current model.