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Time Dependence Calculation of the Breakdown Rate for Electrical Breakdowns in Vitreous Solids
Author(s) -
Danziger M.,
Bernhardt A.
Publication year - 1992
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2221690231
Subject(s) - amorphous solid , dielectric , materials science , character (mathematics) , condensed matter physics , dielectric strength , thermodynamics , chemistry , physics , crystallography , mathematics , geometry , optoelectronics
The anomalous behaviour of different physical quantities in vitreous solids contrary to the behaviour in crystalline solids, mainly the dielectric behaviour, can be described by the effect of a system of additional low‐energy excitations in these solids. This also applies to the amorphous SiO 2 ‐layers in MOS structures. Therefore, a model of breakdown behaviour is developed basing on the assumption that there are fluctuations of the correlated local electrical fields and low‐energy excitations present in these layers. On this basis, the time dependence of breakdown rate is determined. By these calculations, a good correspondence of the experimentally and theoretically determined characteristics is obtained. In these calculations, it should be paid attention to the fact, that the properties of the vitreous solids and the character of the internal interaction change by breakdowns already occured.