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Surface Relief and Dissipation Influence on Plasmon–Phonon Polariton Dispersion of Polar Semiconductors
Author(s) -
Dmitruk N. L.,
Fidrya N. A.,
Snitko O. V.,
Venger E. F.
Publication year - 1990
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2221570211
Subject(s) - polariton , surface plasmon polariton , attenuation , materials science , phonon , dispersion (optics) , surface plasmon , condensed matter physics , surface phonon , surface roughness , surface finish , semiconductor , plasmon , dissipation , optics , optoelectronics , physics , composite material , thermodynamics
The effect of the surface roughness by plasmon‐phonon attenuation on the surface mixed polariton (SP) dispersion is theoretically investigated. It is shown that the dispersions curve displacement is a nonmonotonous function of the attenuation in the presence of surface roughness. Epitaxial n–n + GaAs layers are investigated experimentally by the ATR method.