Optical Properties of High‐Refractory Disilicide Thin Films | Zendy

Henrion W. | Zendy; Lange H. | Zendy

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Optical Properties of High‐Refractory Disilicide Thin Films

Author(s) -

Henrion W.,

Lange H.

Publication year - 1989

Publication title -

physica status solidi (b)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.51

H-Index - 109

eISSN - 1521-3951

pISSN - 0370-1972

DOI - 10.1002/pssb.2221510142

Subject(s) - spectral line , reflectivity , materials science , thin film , refractory (planetary science) , range (aeronautics) , optical spectra , spectral analysis , optoelectronics , electronic band structure , analytical chemistry (journal) , optics , condensed matter physics , chemistry , spectroscopy , nanotechnology , physics , metallurgy , composite material , quantum mechanics , astronomy , chromatography

Optical reflectivity spectra are measured for TiSi 2 , TaSi 2 , and WSi 2 thin films in the spectral range from 0.05 to 6 eV. The optical constants are obtained by Kramers‐Kronig analysis. The spectra are characterized by two spectral regions: the low‐energy free‐carrier response and the interband part. The spectra are discussed on the basis of presently existing band structure information and bonding trend calculations.

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