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Pressure Dependence of Electrical Resistivity in Intercalation Compounds M x TiS 2 (M = 3d Transition Metal)
Author(s) -
Inoue M.,
Koyano M.,
Fukushima K.,
Negishi H.,
Sasaki M.
Publication year - 1987
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2221390126
Subject(s) - electrical resistivity and conductivity , residual resistivity , hydrostatic pressure , intercalation (chemistry) , materials science , condensed matter physics , metal , atmospheric temperature range , hydrostatic equilibrium , analytical chemistry (journal) , chemistry , thermodynamics , inorganic chemistry , metallurgy , physics , quantum mechanics , chromatography
Abstract Electrical resistivities of intercalation compounds of M x TiS 2 (M = Mn, Fe, Co, and Ni; x = 0.05) with the 1T‐CdI 2 ‐type layered structure are measured under hydrostatic pressure up to 15 × 10 8 Pa over the temperature range 1.7 to 300 K. The resistivity change with pressure at room temperature and the temperature dependence at constant pressure are strongly dependent on the guest 3d metals. These experimental results can be explained by taking account of the pressure dependences of the residual resistivity, as well as the temperature‐dependent intra‐ and intervalley scatterings by acoustic phonons.