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Determination of Stresses in SiSiO 2 and Mechanically Affected Si by EPR
Author(s) -
Gehlhoff W.,
Segsa K. H.
Publication year - 1983
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2221180227
Subject(s) - electron paramagnetic resonance , silicon , materials science , spectral line , stress (linguistics) , analytical chemistry (journal) , composite material , metallurgy , nuclear magnetic resonance , chemistry , chromatography , physics , linguistics , philosophy , astronomy
The influence of stresses generated by roughening or oxidation of silicon samples on the EPR spectra of Fe 0 in silicon is investigated. Starting from previous calculations it is possible to explain the changes in the angular dependence of the spectra, and to determine the stress components in the SiO 2 film and in the Si surface affected by roughening. The stress values determined by the EPR analysis are compared with the results obtained by other methods.