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Interstitial Motion During Radiation Damage and Sputtering Processes
Author(s) -
AgulloLopez F.,
Townsend P. D.
Publication year - 1980
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2220970223
Subject(s) - halide , halogen , alkali metal , excitation , sputtering , atomic physics , ion , irradiation , radiation , diffusion , electron , photon , radiation damage , materials science , chemistry , chemical physics , physics , nuclear physics , inorganic chemistry , nanotechnology , thin film , optics , thermodynamics , alkyl , organic chemistry , quantum mechanics
There are two major models for the mechanism of interstitial motion away from the F centre during photon or low energy electron excitation of alkali halides. Previously these models of a focussed replacement collision sequence of halogen ions or a thermally activated H centre diffusion are considered to be alternatives. Some new detailed data on halogen ejection from alkali halides during low energy irradiation are reported which are relevant to this problem. A model is presented which offers an explanation for the data on halogen ejection: the energy spectrum, temperature dependence, and presence of molecular emission. Experiments which would further clarify the model are proposed.