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Oxidation of clean cleaved Ge (111) surfaces
Author(s) -
von Wienskowski J.,
Froitzheim H.
Publication year - 1979
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2220940213
Subject(s) - electron energy loss spectroscopy , oxide , stoichiometry , spectral line , chemistry , materials science , spectroscopy , oxidation process , analytical chemistry (journal) , crystallography , nanotechnology , chemical engineering , physics , metallurgy , transmission electron microscopy , chromatography , quantum mechanics , astronomy , engineering
The oxidation process of clean Ge (111) surfaces is followed up with low‐energy electron loss spectroscopy (ELS). Quasimolecular binding with a characteristic loss at 9.2 eV is recognized first. As oxide is formed at the surface an intense loss at 7.2 eV governs the spectra up to complete oxidation. In comparison with recent results on cleaved Si (111) surfaces the oxide is determined to be non‐stoichiometric.